IEEE Transactions on Electron Devices, 2020

Performance and Low-Frequency Noise of 22-nm FDSOI Down to 4.2 K for Cryogenic Applications

Abstract

This work presents the performance and low frequency noise of 22nm FDSOI CMOS technology. The experimental measurements and the analysis are performed as a function of temperature for the first time, focusing on cryogenic applications, down to 4.2K. The back bias impact on device performance is evaluated. The results reveal that the threshold voltage tuning is found to be temperature independent, allowing extra drain current improvement. This is particularly interesting for short channel devices, whose drain current gain with temperature lowering is expected to be smaller in comparison to long channel MOSFETs. Low frequency noise is characterized by means of time-domain current sampling measurements. Moderate and strong inversion regimes are investigated. The carrier number with correlated mobility fluctuations model can well describe the 1/f noise behavior down to 4.2K. The physical origin behind the drain current low frequency noise to signal power augmentation with temperature lowering could be mainly attributed to the normalized transconductance improvement.

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Author(s)

Bruna Cardoso Paz

Tristan Meunier

CTO & co-founder

Maud Vinet

CEO & co-founder

All authors

Bruna Cardoso Paz, Mikaël Cassé, Christoforos Theodorou, Gérard Ghibaudo, Thorsten Kammler, Luca Pirro, Maud Vinet, Silvano de Franceschi, Tristan Meunier, Fred Gaillard